
BIODERMA
Sebium H2O Purifying Cleansing Micelle Solution
Categories
Face SkincareCleansersMicellar Water
Fungal Acne Safe
This formula is currently classified as fungal acne safe.
Oil-FreeAlcohol-FreeFatty Alcohol-FreeSilicone-FreeEU Allergen-FreeSulfate-FreeParaben-FreeNon-Comedogenic
+10 moreShow less
Ester-FreeGood for Combination Skin TypesGood for Oily Skin TypesHypoallergenicNon-RinseNon-DryingColorant-FreeDeeply Purifies SkinGentleRemoves Makeup and Impurities
Shop Now
Fungal Acne Analysis
Contains Combatting Support
No current trigger concerns are listed, and 1 combatting ingredient is present.
0Triggers
1Combat
Combatting Ingredient
- Propylene Glycol
Ingredients Inside
BETA0Trigger
- WaterSolvent
- PEG-6 Caprylic/Capric GlyceridesSkin Conditioning, Emollient, Surfactant, Emulsifying
- Sodium CitrateMasking, Ph Adjuster, Buffering Agent, Chelating
- Zinc GluconateSkin Conditioning, Cosmetic Biocide, Deodorant, Antibacterial, Soothing, Deodorant
- Copper SulfateSkin Conditioning
- Ginkgo Biloba Leaf ExtractSkin Conditioning
- MannitolSkin Conditioning, Masking, Humectant, Binding Agent, Binding, Flavoring Agent, Moisturising
- XylitolSkin Conditioning, Humectant, Flavoring Agent
- RhamnoseMasking, Fragrance, Humectant, Flavoring Agent
- FructooligosaccharidesSkin Conditioning, Humectant
- Propylene GlycolSolvent, Skin Conditioning, Fragrance, Humectant, Viscosity Controlling, Viscosity Decreasing Agent, Skin-Conditioning agent - Miscellaneous
- Citric AcidMasking, Fragrance, Chelating Agent, Ph Adjuster, Buffering Agent
- Disodium EDTAViscosity Controlling, Chelating Agent
- Cetrimonium BromideSurfactant, Emulsifying, Anti-static Agent, Cosmetic Biocide, Preservative
FragranceMasking, Perfuming, Deodorant
Ingredient Notes
Caution, fragrances may cause allergies, they are also a very common cause of dermatitis & respiratory distress.
EWG8
Packaging and formulations can change. Always verify the live box, bottle, or retailer ingredient list before use.
Community Reviews
No ratings yetNo community reviews yet.